Nikon Eclipse Microscopes L300N/L300ND Series
Eclipse L300N Series – FPD/LSI inspection microscopes
Featuring Nikon’s most advanced optics for unparalleled inspection of the latest wafer types.
Nikon Eclipse L300N/L300ND / Wafer Inspection microscopes incorporate Nikon’s renowned CFI60 infinity optics, offering the world’s highest level of optical performance. The enhanced epi-fluorescence function, which enables 365nm UV excitation, is optimal for the inspection of semiconductor resist residues on 300mm wafers and organic electroluminescence displays.
Epi-fluorescence Observation
The L300N/L300ND features powerful epi-fluorescence observation capabilities, widening the inspection range– including 365 nm excitation. Diascopic illumination and various observation methods such as brightfield, darkfield, simple polarizing, and DIC are also possible. This observation versatility is highly beneficial in inspection of semiconductor resist residues and organic electroluminescence displays.
Four Times Brighter than Conventional Diascopic Observation
The L300ND employs a new light source and advanced optics to provide four times brighter illumination for Diascopic observation.
High-intensity 12V-50W Halogen Illuminator
The new high-intensity 12V-50W halogen illuminator is brighter than that of a standard 12V-100W illuminator.
- Employs the LV-LH50PC precentered lamphouse, which offers greater brightness than that of a 12V-100W illuminator at half the power consumption. It is adequate for observation of semiconductors and LCDs.
- Incorporating a lamphouse rear mirror and optimizing the size of the lamp filament allows effective and uniform illumination on the pupil plane, critical in an optical system. Objectives with a magnification of 50x or higher benefit from an increased brightness of 20 percent compared to the standard 12V-100W illuminator.
- Features environmentally-friendly design and reduces thermal induced defocus.
Motorized Universal Nosepiece
The new motorized universal nosepiece is three times more durable than conventional models.
- Up to six objectives can be mounted.
- Centering mechanism is possible at three nosepiece positions.
- Improved centricity minimizes image shifting when the objective is changed, even with high magnification. This creates stable observations from high to low magnification.
- An anti-flash mechanism engages when the nosepiece is rotated, to protect the operator’s eye.
Antistatic Coatings for Stronger Safeguards Against Contamination
Antistatic coatings have been applied to the body, stage, eyepiece tube and other various controls. These coatings strengthen safeguards against contamination and help prevent damage to samples caused by electrostatic charges, thus contributing to higher yields.
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