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      Nikon Eclipse Microscope L200N/L200ND Series

      Eclipse L200N Series – IC inspection microscopes

      Incorporating CFI60 optics for flawless inspection of 200mm wafers and masks.
      Combined with Nikon’s superior CFI60 LU/L optical system and an extraordinary new illumination system, this microscope provides images with greater contrast, high resolving power and darkfield images three times brighter than before. Used independently, or in combination with wafer loaders, the L200 series performs exceptionally precise optical inspection of wafers, photo masks, reticles and other substrates.

      2 Models to Choose From

      L200: Offers 200mm wafer and mask inspection capabilities for reflected light illumination defect identification with various observation methods such as brightfield, darkfield, simple polarizing and DIC.

      L200ND: Offers 200mm wafer and mask inspection capabilities for both transmitted and relfected light illumination. In addition to the observation methods of the L200N, epi-fluorescence observations including 365nm UV exicitation is possible.

      Contamination Safeguards

      The bodies of these microscopes are finished with electrostatic discharge coatings to prevent foreign particles from adhering to the microscope. Furthermore, the motorized nosepiece uses a shielded center motor that traps foreign particles inside, preventing them from falling onto the sample.

      High Intensity Halogen Illumination

      The high intensity 12V-50W halogen illuminator, provides greater brightnessthat than of a 12V-100W halogen illuminator with half the power consumption. This new lamphouse incorporates a rear mirror and optimized lamp filament size to allow effective and uniform illumination on the pupil plane which is critical in an optical plane.

      Improved DIC microscopy

      Nikon’s CFI LU Plan objectives allow the use of multiple observation techniques, including brightfield, darkfield, and Nomarski DIC using a single objective. For DIC, simply insert a single Nomarski prism into the nosepiece that works for all magnification ranges.

      SEMI S2-0200, S8-0600 Compliant Design

      Incorporating a SEMI-compliant design, controls and knobs are positioned low and close to the operator while the eyepoint is set at the ideal height for comfortable operation. With the controls located comfortably in the microscope base, hand movement is minimal, allowing concentration on the inspection process. The eyepiece is moved closer to the operator so that he or she can assume a more erect sitting posture. This also positions the operator farther from the stage to provide a more ergonomic and safe viewing position.

      Motorized Nosepiece with Software Control

      The motorized universal nosepiece for the L200N series microscope has improved centricity and is three times more durable than conventional models. It also contains an anti flash mechanism to protect the operators eyes when the nosepiece is rotated. The L200A built in motorized nosepiece includes a slot for DIC attachments, features a mechanical click stop and is controlled by software that enables the system to stop precisely at each respective objective position.

      Vibration Isolation


      Applying computer-aided engineering (CAE), Nikon increased the rigidity of the L200 series dramatically, making these microscopes three times less susceptible to floor vibrations when compared with conventional equipment. This, in turn, reduces the chance of unwanted blur or image shifts even during high magnification observations. While this superior design increases stability, it also results in a smaller footprint.

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      Description

      Eclipse L200N Series – IC inspection microscopes

      Incorporating CFI60 optics for flawless inspection of 200mm wafers and masks.
      Combined with Nikon’s superior CFI60 LU/L optical system and an extraordinary new illumination system, this microscope provides images with greater contrast, high resolving power and darkfield images three times brighter than before. Used independently, or in combination with wafer loaders, the L200 series performs exceptionally precise optical inspection of wafers, photo masks, reticles and other substrates.

      2 Models to Choose From

      L200: Offers 200mm wafer and mask inspection capabilities for reflected light illumination defect identification with various observation methods such as brightfield, darkfield, simple polarizing and DIC.

      L200ND: Offers 200mm wafer and mask inspection capabilities for both transmitted and relfected light illumination. In addition to the observation methods of the L200N, epi-fluorescence observations including 365nm UV exicitation is possible.

      Contamination Safeguards

      The bodies of these microscopes are finished with electrostatic discharge coatings to prevent foreign particles from adhering to the microscope. Furthermore, the motorized nosepiece uses a shielded center motor that traps foreign particles inside, preventing them from falling onto the sample.

      High Intensity Halogen Illumination

      The high intensity 12V-50W halogen illuminator, provides greater brightnessthat than of a 12V-100W halogen illuminator with half the power consumption. This new lamphouse incorporates a rear mirror and optimized lamp filament size to allow effective and uniform illumination on the pupil plane which is critical in an optical plane.

      Improved DIC microscopy

      Nikon’s CFI LU Plan objectives allow the use of multiple observation techniques, including brightfield, darkfield, and Nomarski DIC using a single objective. For DIC, simply insert a single Nomarski prism into the nosepiece that works for all magnification ranges.

      SEMI S2-0200, S8-0600 Compliant Design

      Incorporating a SEMI-compliant design, controls and knobs are positioned low and close to the operator while the eyepoint is set at the ideal height for comfortable operation. With the controls located comfortably in the microscope base, hand movement is minimal, allowing concentration on the inspection process. The eyepiece is moved closer to the operator so that he or she can assume a more erect sitting posture. This also positions the operator farther from the stage to provide a more ergonomic and safe viewing position.

      Motorized Nosepiece with Software Control

      The motorized universal nosepiece for the L200N series microscope has improved centricity and is three times more durable than conventional models. It also contains an anti flash mechanism to protect the operators eyes when the nosepiece is rotated. The L200A built in motorized nosepiece includes a slot for DIC attachments, features a mechanical click stop and is controlled by software that enables the system to stop precisely at each respective objective position.

      Vibration Isolation


      Applying computer-aided engineering (CAE), Nikon increased the rigidity of the L200 series dramatically, making these microscopes three times less susceptible to floor vibrations when compared with conventional equipment. This, in turn, reduces the chance of unwanted blur or image shifts even during high magnification observations. While this superior design increases stability, it also results in a smaller footprint.

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      Nikon Eclipse Microscope L200N/L200ND Series

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      Funding

      Financing solutions for the purchase of new equipment, through BCR Leasing or Grenke.

      See Financing Methods

      Specifications

      Nikon Eclipse Microscope L200N - Specifications

      Main body : motorized control for nosepiece , light intensity control, aperture diaphragm control ;
      Nosepiece :fixed-motorized Sextuple Universal Nosepiece ;
      Episcopic illumination : halogen lamp ;
      Eyepiece tube  : trinocular and binocular eyepiece tube ;
      Stage  :
      – Manual stage 8×8 (Stroke: 205×205 mm );
      Objectives: 1x, 2.5x, 5x, 10x, 20x, 50x, 100x, 150x ;
      Maximum sample size : 200 mm diameter  ;
      Weight : 45 kg ;

      Nikon Eclipse Microscope L200ND - Specifications

      Main body : motorized control for nosepiece , light intensity control, aperture diaphragm control ;
      Nosepiece :fixed-motorized Sextuple Universal Nosepiece ;
      Episcopic illumination : halogen lamp ;
      Diascopic illumination: halogen lamp/ LED lamp ;
      Eyepiece tube  : trinocular eyepiece tube ;
      Stage  :
      – Manual stage 8×8 (Stroke: 205×205 mm );
      Objectives: 1x, 2.5x, 5x, 10x, 20x, 50x, 100x, 150x ;
      Maximum sample size : 200 mm diameter ;
      Weight : 45 kg ;

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